Grazing Incidence X-ray Scattering for the Characterisation of InP Wafers
نویسندگان
چکیده
Grazing incidence specular and diffuse X-ray scattering measurements have been used to study variations in polishing of InP single crystal wafers. Excellent agreement between experimental and simulated data is achieved when graded surface layers typically 3081 in thickness, and of higher density than the bulk material, are included. Figuring was found on all samples examined and the width of the specular peak in specimen-only scans rose as the width of the triple axis asymmetric 224 diffraction rocking curve increased. A similar relation was found between lateral correlation length and symmetric 004 rocking curve width.
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